Alignment mark detecting optical system

Details Alignment mark detecting optical system Alignment mark detecting optical system

1989-05-23

1991-09-17

Rosenberger, Richard A.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

G01B 1100

Patent

active

050489682

ABSTRACT:
In an alignment mark detecting optical system usable with an automatic alignment apparatus wherein alignment marks of a wafer and a mask are scanned by a laser beam to detect the state of misalignment therebetween, the laser beam scans the surface of the wafer opposed to the mask and the surface of the mask opposed to the wafer, i.e., the front face of the wafer and the back face of the mask. The light beams reflected by the surfaces are introduced to one or more photodetectors.

REFERENCES:
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patent: 3652163 (1972-03-01), Borkowski et al.
patent: 3684384 (1972-08-01), Hojo et al.
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patent: 4225241 (1980-09-01), Dandliker
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patent: 4362385 (1982-12-01), Lobach
patent: 4402596 (1983-09-01), Kanatani
patent: 4474469 (1984-10-01), Abe
patent: 4487505 (1984-12-01), Nakano et al.
Feder et al., "Mask to Wafer Alignment System", IBM Technical Disclosure Bulletin, vol. 16, No. 4, (Sep. 1973), p. 1307.

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