Alignment mark, alignment apparatus and method, exposure...

Details Alignment mark, alignment apparatus and method, exposure... Alignment mark, alignment apparatus and method, exposure...

2006-02-28

2006-02-28

Turner, Samuel A. (Department: 2877)

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

Reexamination Certificate

active

07006225

ABSTRACT:
An alignment mark includes a first mark usable for global alignment measurement in the direction of a scribe line, and a second mark usable for pre-alignment measurement in a direction perpendicular to the direction of the scribe line. The first mark is formed by arranging a plurality of strip-shaped X measurement marks whose longitudinal direction is perpendicular to the direction of the scribe line. In the second mark, the strip-shaped second measurement marks are arranged at the two ends of the first mark such that the longitudinal direction of the second measurement mark is perpendicular to that of the first measurement mark. The alignment mark can be shared by global alignment and pre-alignment, and applied to a narrow scribe line.

REFERENCES:
patent: 5050111 (1991-09-01), Ayata et al.
patent: 5204739 (1993-04-01), Domenicali
patent: 5249016 (1993-09-01), Tanaka
patent: 5456404 (1995-10-01), Robinette et al.
patent: 5648854 (1997-07-01), McCoy et al.
patent: 5774575 (1998-06-01), Tanaka et al.
patent: 5815594 (1998-09-01), Tanaka
patent: 6870623 (2005-03-01), Tanaka et al.
patent: 2004/0021866 (2004-02-01), Watts et al.

Affiliated with

Also associated with

Rating

Alignment mark, alignment apparatus and method, exposure... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Alignment mark, alignment apparatus and method, exposure..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Alignment mark, alignment apparatus and method, exposure... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3677802