Alignment for layer formation through determination of target va

Details Alignment for layer formation through determination of target va Alignment for layer formation through determination of target va

1997-10-15

1998-07-21

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

430 30, G03F 900

Patent

active

057833419

ABSTRACT:
An aligning method for aligning a layer to be formed on a substrate with layers which have been formed on the substrate includes the steps of measuring the positions of marks formed on each of at least two layers which have been formed on the substrate, and determining the positions of the layer to be formed on the substrate based on results of the measurement of the positions of the marks. The invention also relates to a method for manufacturing devices including the steps of coating a resist on a wafer on which a plurality of layers are laminated, transferring a pattern on a mask onto the resist on the surface of the wafer, developing the resist on the wafer to form a layer of the pattern on the surface of the wafer, measuring the positions of marks formed on each of at least two layers from among the plurality of layers, and aligning the wafer with the mask based on the results of the measurement.

REFERENCES:
patent: 5142156 (1992-08-01), Ozawa et al.
patent: 5150391 (1992-09-01), Ebinuma et al.
patent: 5155523 (1992-10-01), Hara et al.
patent: 5182615 (1993-01-01), Kurosawa et al.
patent: 5468580 (1995-11-01), Tanaka

Affiliated with

Also associated with

Rating

Alignment for layer formation through determination of target va does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Alignment for layer formation through determination of target va, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Alignment for layer formation through determination of target va will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1645327