Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Patent
1980-07-08
1983-06-28
Rosenberger, R. A.
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
356363, G01B 1100
Patent
active
043902790
ABSTRACT:
An alignment device in an IC projection exposure apparatus includes a projection lens system for viewing to a wafer surface having a reference mark comprising a periodic pattern structure having a predetermined period in one direction and a mask surface having a reference mark to be position-adjusted with respect to the reference mark of the wafer, the projection lens system being capable of forming an image of an observation light source on the wafer surface through the mask surface, and an observation optical system for detecting the reflected light from the wafer surface passed through the projection lens system. The device further includes means for selecting a particular component of the diffracted light from the wafer surface formed by the pattern of the reference mark on the wafer, and for directing the particular component to the observation optical system. Said means includes a light-intercepting member provided near the pupil of the observation optical system and formed with a light-transmitting opening extending in a band-like form in a direction orthogonal to the direction of the period of the reference mark on the wafer surface.
REFERENCES:
patent: 4127777 (1978-11-01), Binder
patent: 4252442 (1981-02-01), Dandliker et al.
Jenkins et al. Fundamentals of Optics, 3rd Edition, McGraw-Hill Book Company, New York, .COPYRGT.1957 pp. 329-333.
Nippon Kogaku K. K.
Rosenberger R. A.
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