Alignment device in an IC projection exposure apparatus

Optics: measuring and testing – By alignment in lateral direction – With registration indicia

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

356363, G01B 1100

Patent

active

043902790

ABSTRACT:
An alignment device in an IC projection exposure apparatus includes a projection lens system for viewing to a wafer surface having a reference mark comprising a periodic pattern structure having a predetermined period in one direction and a mask surface having a reference mark to be position-adjusted with respect to the reference mark of the wafer, the projection lens system being capable of forming an image of an observation light source on the wafer surface through the mask surface, and an observation optical system for detecting the reflected light from the wafer surface passed through the projection lens system. The device further includes means for selecting a particular component of the diffracted light from the wafer surface formed by the pattern of the reference mark on the wafer, and for directing the particular component to the observation optical system. Said means includes a light-intercepting member provided near the pupil of the observation optical system and formed with a light-transmitting opening extending in a band-like form in a direction orthogonal to the direction of the period of the reference mark on the wafer surface.

REFERENCES:
patent: 4127777 (1978-11-01), Binder
patent: 4252442 (1981-02-01), Dandliker et al.
Jenkins et al. Fundamentals of Optics, 3rd Edition, McGraw-Hill Book Company, New York, .COPYRGT.1957 pp. 329-333.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Alignment device in an IC projection exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Alignment device in an IC projection exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Alignment device in an IC projection exposure apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-931557

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.