Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Patent
1998-06-18
2000-12-12
Kim, Robert
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
356400, 250548, G01N 1100
Patent
active
061606227
ABSTRACT:
An alignment device, for use in a lithographic apparatus, for aligning a first object, provided with a first alignment mark relative to a second object, provided with a second alignment mark, employs as a radiation source a laser which emits an alignment beam having a wavelength which is of the order of 1000 nm and to the order of 1100 nm.
REFERENCES:
patent: 4251160 (1981-02-01), Bouwhuis et al.
patent: 4356392 (1982-10-01), Wittekoek et al.
patent: 4737823 (1988-04-01), Bouwer
patent: 4778275 (1988-10-01), Van den Brink et al.
patent: 5026166 (1991-06-01), Van der Werf
patent: 5100237 (1992-03-01), Wittekoek et al.
patent: 5191200 (1993-03-01), Van der Werf et al.
patent: 5481362 (1996-01-01), Van Den Brink et al.
patent: 5528372 (1996-06-01), Kawashima
patent: 5530552 (1996-06-01), Mermangen et al.
Dictionary of Electronic Terms, 1970 pp. 46, Col. 2.
Dirksen Peter
Nuijs Antonius M.
ASM Lithography B.V.
Kim Robert
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