Alignment device

Optics: measuring and testing – By alignment in lateral direction

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Details

356401, G01B 1100

Patent

active

043858384

ABSTRACT:
An alignment device for registering an object to a predetermined position with high precision and for calculating inclination of the object with respect to its predetermined position, which is constructed with a moving device for mounting thereon the object and moving the same two-dimensionally, a coordinate measuring device having orthogonally intersecting first and second measuring axes to measure the coordinates of the moving device in both directions of orthogonally intersecting first and second measuring axes of the object, an observing device having a first observing optical system with the center of observation (the first observation center) thereof being substantially on the first measuring axis and a second observing optical system with the center of observation (the second observation center) thereof being substantially on the second measuring axis, and a setting device to set, on the coordinate measuring device, the coordinate values of the first and second observation centers with the substantial intersection of the first and second measuring axes as the origin point, by detection, through movement of the moving device, of any one of a plurality of first marks on the object along the first axis when it is positioned at the first observation center, and of any one of a plurality of second marks along the second axis when it is positioned at the second observation center, thereby making the established coordinate values the references for movement of the moving device.

REFERENCES:
patent: 3600811 (1971-08-01), Weyrauch
patent: 4074131 (1978-02-01), Schwebel
Fredriksen, T. R. "New Wafer Alignment Technique" Microelectronics & Reliability, vol. 15 #2, 1976, pp. 147-151.
Anon, "IC Pattern Printing Techniques Improving" JEE #111, 3/76, pp. 35-36.

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