Alignment device

Details Alignment device Alignment device

1979-08-30

1981-11-17

Nelms, David C.

Radiant energy

Photocells; circuits and apparatus

Optical or pre-photocell system

250548, G01N 2186

Patent

active

043013635

ABSTRACT:
An alignment device of a type, wherein an alignment pattern provided on a mask for fabrication of a semiconductor circuit element and an alignment pattern provided on a wafer are photoelectrically read in a dark field by a flying spot scanning system or a flying image scanning system to detect a relative positional relationship between the mask and the wafer, and a desired positional relationship is obtained by moving at least one of the mask and wafer on the basis of a detected signal. The novel feature of this alignment device resides in that the size of a line forming the alignment pattern along the scanning line is twice or more as large as the size of the scanning spot.

REFERENCES:
patent: 3989385 (1976-11-01), Dill et al.
patent: 4167677 (1979-09-01), Suzki

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