Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Patent
1990-06-12
1991-04-02
Evans, F. L.
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
250548, 356363, G01B 1126
Patent
active
050043480
ABSTRACT:
An apparatus for aligning a mask and a substrate by detecting diffracted light from a first and second diffraction gratings. The apparatus comprises an illumination light source for irradiating light of a predetermined wavelength, a detection optical system, having an aberration along an optical axis corrected in a predetermined manner, and an orientation control device for controlling the light orientation of the predetermined wavelength.
REFERENCES:
patent: 4251160 (1981-02-01), Bouwhuis et al.
patent: 4269505 (1981-05-01), Mayer
patent: 4492459 (1985-01-01), Omata
patent: 4710026 (1987-12-01), Magome et al.
Evans F. L.
Nikon Corporation
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