Optics: measuring and testing – By alignment in lateral direction – With light detector
Patent
1985-08-08
1988-01-05
Rosenberger, R. A.
Optics: measuring and testing
By alignment in lateral direction
With light detector
356399, G01B 1100
Patent
active
047172576
ABSTRACT:
An alignment device for aligning a reticle and a wafer with the aid of a projection lens system for projecting an integrated circuit pattern of the reticle onto the wafer, wherein a light beam from the wafer is passed throught the projection lens and is directed by way of an objective lens to a spatial filter to detect a positional relation between the reticle and the wafer. According to the position of an optical axis of the objective lens relative to an optical axis of the projection lens and according to the telecentricity of the projection lens, the spatial filter is displaced relative to the optical axis of the objective lens, whereby a particular component of the light beam from the wafer is positively extracted out, without being affected against by displacement of the objective lens for the alignment operation.
REFERENCES:
patent: 4251129 (1981-02-01), Suzki et al.
patent: 4538914 (1985-09-01), Yomoda et al.
Ishiyama Ichiro
Kaneta Minoru
Canon Kabushiki Kaisha
Cooper Crystal D.
Rosenberger R. A.
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