Alignment detection optical system of projection type aligner

Optics: measuring and testing – By alignment in lateral direction – With registration indicia

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G01B 1127

Patent

active

047446668

ABSTRACT:
In an alignment detection optical system designed to observe an alignment pattern of a mask and an image of an alignment pattern of a wafer formed on the alignment pattern of the mask by a projection lens in a projection type aligner, there is provided a spatial filter designed to select only the reflected light having a desired reflection angle from the light reflected by the alignment pattern composed of steps formed on a surface of the wafer.

REFERENCES:
patent: 4362389 (1982-12-01), Koizumi et al.
patent: 4641035 (1987-02-01), Suzuki et al.

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