Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Patent
1986-07-16
1988-05-17
LaRoche, Eugene R.
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
G01B 1127
Patent
active
047446668
ABSTRACT:
In an alignment detection optical system designed to observe an alignment pattern of a mask and an image of an alignment pattern of a wafer formed on the alignment pattern of the mask by a projection lens in a projection type aligner, there is provided a spatial filter designed to select only the reflected light having a desired reflection angle from the light reflected by the alignment pattern composed of steps formed on a surface of the wafer.
REFERENCES:
patent: 4362389 (1982-12-01), Koizumi et al.
patent: 4641035 (1987-02-01), Suzuki et al.
Nakashima Naoto
Nakata Toshihiko
Oshida Yoshitada
Hitachi , Ltd.
LaRoche Eugene R.
Mis David
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