Alignment condition determination method and apparatus of...

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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C355S072000, C355S077000, C356S400000

Reexamination Certificate

active

07746446

ABSTRACT:
Alignment parameters determination method with less overlay error after exposure without tremendous expending time and cost is provided. Provision is made of a fetching unit performing position measurement and statistical processing to obtain reference computation results. Another fetching unit obtains reference processing results by positioning and exposing shots at a predetermined exposure apparatus based on the reference computation results, then measuring overlay error for the shots. Another fetching unit changes at least parts of the predetermined alignment parameters and performs position measurement and statistical processing to obtain comparative computation results. A controller650calculates estimated overlay error when assuming positioning and exposure of shots at a predetermined exposure apparatus based on the comparative computation results using the reference computation results, comparative computation results, and reference processing results.

REFERENCES:
patent: 5525808 (1996-06-01), Irie et al.
patent: 6416912 (2002-07-01), Kobayashi et al.
patent: 2003/0071980 (2003-04-01), Ina et al.
patent: 2003/0202182 (2003-10-01), Matsumoto et al.
patent: 2003/0204282 (2003-10-01), Oishi et al.
patent: 2003/0204348 (2003-10-01), Suzuki et al.
patent: 2004/0058540 (2004-03-01), Matsumoto et al.
patent: 2004/0223157 (2004-11-01), Nakajima
patent: 2004/0257573 (2004-12-01), Matsumoto
patent: 2005/0254030 (2005-11-01), Tolsma et al.
patent: A 4-32219 (1992-02-01), None
patent: A 5-335212 (1993-12-01), None
patent: A 2000-173921 (2000-06-01), None
patent: A 2002-237451 (2002-08-01), None
patent: A 2003-197517 (2003-07-01), None
patent: A 2004-31929 (2004-01-01), None

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