Alignment apparatus, exposure apparatus using the same, and...

Details Alignment apparatus, exposure apparatus using the same, and... Alignment apparatus, exposure apparatus using the same, and...

2007-02-06

2007-02-06

Lauchman, Layla G. (Department: 2877)

Optics: measuring and testing

Position or displacement

Position transverse to viewing axis

C356S400000, C355S053000, C250S548000

Reexamination Certificate

active

11132260

ABSTRACT:
An alignment apparatus for aligning a reflective reticle includes a light source for emitting alignment light, an optical alignment mark provided on the reticle, and a reference mark provided on a reticle stage that holds the reticle. A detecting unit detects the alignment light reflected from the alignment mark and the reference mark, and the reticle is aligned on the basis of the result of detection by the detection unit.

REFERENCES:
patent: 4669883 (1987-06-01), Ina et al.
patent: 4834540 (1989-05-01), Totsuka et al.
patent: 4883359 (1989-11-01), Ina et al.
patent: 4886974 (1989-12-01), Ina
patent: 4901109 (1990-02-01), Mitome et al.
patent: 5133603 (1992-07-01), Suzuki et al.
patent: 5309197 (1994-05-01), Mori et al.
patent: 5323207 (1994-06-01), Ina
patent: 5625453 (1997-04-01), Matsumoto et al.
patent: 5659384 (1997-08-01), Ina
patent: 5812271 (1998-09-01), Kim
patent: 5910843 (1999-06-01), Oishi
patent: 6124922 (2000-09-01), Sentoku
patent: 6151120 (2000-11-01), Matsumoto et al.
patent: 6154281 (2000-11-01), Sentoku et al.
patent: 6421124 (2002-07-01), Matsumoto et al.
patent: 6714691 (2004-03-01), Outsuka
patent: 6727980 (2004-04-01), Ota et al.
patent: 6741328 (2004-05-01), Yonekawa et al.
patent: 6992780 (2006-01-01), Sentoku et al.
patent: 2002/0176096 (2002-11-01), Sentoku et al.
patent: 2003/0218730 (2003-11-01), Murakami et al.
patent: 0 756 206 (1997-01-01), None
patent: 0 964 308 (1999-12-01), None
patent: 11-224854 (1999-08-01), None

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