Alignment apparatus, exposure apparatus and device...

Details Alignment apparatus, exposure apparatus and device... Alignment apparatus, exposure apparatus and device...

2007-09-18

2007-09-18

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Focus or magnification control

C355S053000

Reexamination Certificate

active

11214252

ABSTRACT:
An alignment apparatus for aligning with each other a mask stage that supports a mask that has an exposure pattern and a wafer stage that supports an object by using a light with wavelength of 1 nm to 50 nm, said alignment apparatus including a substrate for forming a first reference pattern similar to a second reference pattern formed on the mask or the mask stage, and a detection part for detecting a light from the substrate, wherein said substrate and detection part form a hollow housing, in which a gas is filled.

REFERENCES:
patent: 6130431 (2000-10-01), Berger
patent: 6333776 (2001-12-01), Taniguchi
patent: 2002/0101574 (2002-08-01), Tsuji
patent: 2003-409881 (2003-12-01), None

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