Alignment apparatus and exposure apparatus using the same

Details Alignment apparatus and exposure apparatus using the same Alignment apparatus and exposure apparatus using the same

2006-07-11

2006-07-11

Waks, Joseph (Department: 2834)

Electrical generator or motor structure

Dynamoelectric

Linear

Reexamination Certificate

active

07075198

ABSTRACT:
An exposure apparatus that includes a first movable stage which holds a first wafer and aligns the first wafer at a predetermined position, a second movable stage which holds a second wafer and aligns the second wafer at a predetermined position, first stator coils for driving in a first direction one of the first and second movable stages located in a measurement region for measuring an exposure result, second stator coils for driving the other of the first and second movable stages located in an exposure region for performing exposure in the first direction independently of the movable stage in the measurement region, third stator coils for independently driving the first and second movable stages in a second direction perpendicular to the first direction, and a current control device for supplying to the first to third stator coils control currents having phase differences to generate driving forces between movable element magnets of the first and second movable stages and the stator coils facing the movable element magnets.

REFERENCES:
patent: 5565747 (1996-10-01), Sasaki et al.
patent: 5684856 (1997-11-01), Itoh et al.
patent: 5841250 (1998-11-01), Korenaga et al.
patent: 5886432 (1999-03-01), Markle
patent: 6002465 (1999-12-01), Korenaga
patent: 6037680 (2000-03-01), Korenaga et al.
patent: 6072251 (2000-06-01), Markle
patent: 6107703 (2000-08-01), Korenaga
patent: 6114781 (2000-09-01), Hazelton et al.
patent: 6128069 (2000-10-01), Korenaga
patent: 6144119 (2000-11-01), Hazelton
patent: 6147421 (2000-11-01), Takita et al.
patent: 6172738 (2001-01-01), Korenaga et al.
patent: 6177978 (2001-01-01), Korenaga
patent: 6188147 (2001-02-01), Hazelton et al.
patent: 6208045 (2001-03-01), Hazelton et al.
patent: 6265793 (2001-07-01), Korenaga
patent: 6285097 (2001-09-01), Hazelton et al.
patent: 6316849 (2001-11-01), Konkola et al.
patent: 6320645 (2001-11-01), Inoue et al.
patent: 6323567 (2001-11-01), Hazelton et al.
patent: 6339266 (2002-01-01), Tanaka
patent: 6359677 (2002-03-01), Itoh et al.
patent: 6414742 (2002-07-01), Korenaga et al.
patent: 6441514 (2002-08-01), Markle
patent: 6445093 (2002-09-01), Binnard
patent: 6479991 (2002-11-01), Korenaga
patent: 6570645 (2003-05-01), Korenaga et al.
patent: 6650079 (2003-11-01), Binnard
patent: 6661127 (2003-12-01), Frissen et al.
patent: 6791214 (2004-09-01), Korenaga
patent: 6847134 (2005-01-01), Frissen et al.
patent: 2002/0079888 (2002-06-01), Frissen et al.
patent: 2002/0096946 (2002-07-01), Bisschops
patent: 2003/0007140 (2003-01-01), Korenaga
patent: 2003/0098966 (2003-05-01), Korenaga et al.
patent: 2003/0102723 (2003-06-01), Korenaga
patent: 2003/0179359 (2003-09-01), Korenaga
patent: 56-19606 (1981-02-01), None
patent: 8-6642 (1996-01-01), None
European Search Report dated Jul. 13, 2004, issued in corresponding European patent application No. EP 03 25 8183, forwarded in a Communication dated Jul. 19, 2004.

Affiliated with

Also associated with

Rating

Alignment apparatus and exposure apparatus using the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Alignment apparatus and exposure apparatus using the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Alignment apparatus and exposure apparatus using the same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3538390