Alignment apparatus

Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

356401, G01N 2186

Patent

active

042753066

ABSTRACT:
An alignment apparatus in which alignment marks on a mask and a wafer for producing a semiconductor circuit element are photoelectrically read and the positional deviation between the two alignment marks is detected and one of the mask and the wafer is parallel-moved in accordance with the detected amount to align the mask and wafer into a predetermined positional relation. This apparatus has the function of correcting any interval error which may be present between the alignment marks.

REFERENCES:
patent: 4070117 (1978-01-01), Johannsmeier et al.
patent: 4127777 (1978-11-01), Binder

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Alignment apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Alignment apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Alignment apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2210048

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.