Optics: measuring and testing – By alignment in lateral direction – With light detector
Patent
1976-05-25
1979-10-09
Corbin, John K.
Optics: measuring and testing
By alignment in lateral direction
With light detector
356375, G01B 1126
Patent
active
041704185
ABSTRACT:
An alignment apparatus, in which a mask is overlaid on a wafer and a relative displacement between the wafer and a target pattern formed on the mask is detected to effect alignment thereof, comprises a slit frame adapted to reciprocate in a direction substantially parallel to the top surface of the mask and having a slit formed therein, an illumination optical system for illuminating the target pattern, an image formation optical system for forming the image of the target pattern onto the slit of the slit frame, a light sensing element mounted on the slit frame for detecting the target pattern image formed by the image formation optical system through the slit to convert the image into an electric signal, and a displacement detector for detecting the amount of movement of the reciprocation of the slit frame to convert the amount of movement into a position signal which the light sensing element scans, whereby the output signals from the displacement detector and the light sensing element are used to detect the relative position between the mask and the target pattern on the wafer and the mask is moved relative to the wafer such that the relative displacement amount becomes zero.
REFERENCES:
patent: 3038369 (1962-06-01), Davis
patent: 3941980 (1976-03-01), Okamoto et al.
patent: 3943359 (1976-03-01), Matsumoto et al.
patent: 3955072 (1976-05-01), Johannsmeier et al.
Aiuchi Susumu
Ikeda Minoru
Matsumoto Yoshio
Corbin John K.
Hitachi , Ltd.
Rosenberger R. A.
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