Alignment apparatus

Details Alignment apparatus Alignment apparatus

1984-12-14

1987-06-30

Wan, Gene

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

250234, G01N 2186, H01J 314

Patent

active

046773010

ABSTRACT:
A position alignment apparatus aligns a photosensitive substrate and a mask (projection image) at high speed and with high precision. The apparatus has a projection optical system for projecting a pattern image on a mask or reticle onto a photosensitive substrate, a detector for detecting a two-dimensional misalignment of a projected pattern image and a wafer, and means for moving the wafer along orthogonal x- and y-axis directions and for rotating the wafer along a rotational direction within a plane defined by the x- and y-axis directions so as to eliminate the misalignment, wherein the detector has first detecting means with an optical system for detecting at least a misalignment of the wafer along the x-axis direction through the projection lens, and second detecting means with an optical system separate from the projection lens and for detecting at least a misalignment of the wafer along a rotational direction.

REFERENCES:
patent: 4311389 (1982-01-01), Fay et al.

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