Alignment apparatus

Details Alignment apparatus Alignment apparatus

1984-11-05

1986-07-15

Haroian, Harry N.

Optics: image projectors

Miscellaneous

355 55, 353101, 33180R, G03B 2734

Patent

active

046002820

ABSTRACT:
An alignment apparatus for positioning on a wafer an image of a mask formed by a projection optical system. The apparatus includes a first detecting system for detecting the distance between an imaging plane of the optical system and the wafer, a driving mechanism for moving the wafer in the direction of the optical axis of the optical system and a second detecting system for detecting the amount of movement of the wafer. The driving mechanism is controlled while the distance detected by the first detecting system is compared with the amount of movement detected by the second detecting system, whereby the wafer is correctly and accurately positioned on the imaging plane of the optical system.

REFERENCES:
patent: 4344160 (1982-08-01), Gabriel et al.
patent: 4420233 (1983-12-01), Nomoto et al.
patent: 4477183 (1984-10-01), Kawamura et al.

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