Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems
Patent
1987-07-28
1989-01-31
Westin, Edward P.
Radiant energy
Photocells; circuits and apparatus
Photocell controls its own optical systems
356401, G01B 1127
Patent
active
048018082
ABSTRACT:
An alignment system in an alignment and exposure apparatus for exposing a wafer to a pattern of a mask, for use in the manufacture of semiconductor devices, the alignment system including an objective lens system for observing alignment marks formed on the mask and the wafer respectively, in order to bring the mask and the wafer into a predetermined alignment relation, prior to the exposure of the wafer. The objective lens system is capable of observing a mark that is formed on a member for holding an exposure optical system in order to allow alignment of the mask relative to the exposure optical system, whereby a reference position of the objective lens system is determined on the basis of the mark formed on the holding member and whereby accurate movement of the objective lens system during movement thereof to a position for observing the alignment marks on the mask and the wafer is assured.
REFERENCES:
patent: 4167677 (1979-09-01), Suzki
patent: 4563094 (1986-01-01), Yamada
patent: 4611122 (1986-09-01), Nakano et al.
patent: 4655599 (1987-04-01), Ayata et al.
Canon Kabushiki Kaisha
Westin Edward P.
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