Alignment and exposure apparatus

Details Alignment and exposure apparatus Alignment and exposure apparatus

1991-11-19

1993-07-27

Rosenberger, Richard A.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

353 53, H01L 2130

Patent

active

052314715

ABSTRACT:
An alignment mark detecting device usable with an exposure apparatus for transferring a pattern of an original onto a workpiece having a radiation-sensitive layer, includes a holder for holding the workpiece, a radiation energy source for irradiating the workpiece held by the holder with radiation energy to remove a portion of the radiation-sensitive layer adjacent to an alignment mark formed on the workpiece, and a holder for detecting the alignment mark of the workpiece held by the holder.

REFERENCES:
patent: 4571712 (1986-02-01), Romano et al.
patent: 4573791 (1980-03-01), Phillips
patent: 4641035 (1987-02-01), Suzuki et al.
patent: 4752668 (1988-06-01), Rosenfield et al.
"Square Blue Laser Focuses Ultraviolet Energy" Schefter Popular Science May 1983.
Nikeei Microdevices, Feb. 1987 issue, pp. 113-124.
"Photo-etching of PMMA by Excimer Laser Irradiation", Study on Laser, vol. 8, No. 6, pp. 941-943 and translation.
"Photoablation of Resist Coated Alignment Targets to Improve VLSI Pattern Overlay", Lasers in Microlithography, SPIE, vol. 774, (1987), pp. 172-180.
"Lithographic Trends", Semiconductor International, vol. 23, Dec. 1986.

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