Alignment and exposure apparatus

Details Alignment and exposure apparatus Alignment and exposure apparatus

1991-11-19

1992-11-03

Adams, Russell E.

Photocopying

Projection printing and copying cameras

Identifying, composing, or selecting

355 53, G03B 2742, G03B 2753

Patent

active

051609576

ABSTRACT:
A mark detecting device usable in an alignment and exposure apparatus for aligning an alignment mark of a mask with an alignment mark of a wafer and for exposing a resist layer provided on the surface of the wafer to a pattern of the mask with radiation. The device including a portion for forming a photoprint of the alignment mark of the mask on the resist layer provided on the surface of the wafer, a portion for removing at least a portion of the resist layer adjacent to the alignment mark of the wafer, and a portion for detecting the alignment mark of the wafer and the photoprint of the alignment mark of the mask.

REFERENCES:
patent: 4402596 (1983-09-01), Kanatani
patent: 4405229 (1983-09-01), Mayer
patent: 4422755 (1983-12-01), Phillips
patent: 4473293 (1984-09-01), Phillips
patent: 4641035 (1987-02-01), Suzuki et al.
patent: 4679942 (1987-07-01), Suwa et al.
patent: 4741622 (1988-05-01), Suwa et al.
patent: 4752668 (1988-06-01), Rosenfield et al.
"Photo-etching of PMMA by Excimer Laser Irradiation", Study on Laser; vol. 8, No. 6, pp. 941-943.
"Photoablation of Resist Coated Alignment Targets to Improve VLSI Pattern Overlay", Lasers in Microlithography, SPIE, vol. 774 (1987) pp. 172-180.
"Lithographic Trends", Semiconductor International vol. 23 Dec. 1986.

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