Aligning method, exposure method, exposure apparatus, and...

Details Aligning method, exposure method, exposure apparatus, and... Aligning method, exposure method, exposure apparatus, and...

2007-05-01

2007-05-01

Lauchman, Layla G. (Department: 2877)

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

C355S053000, C430S022000

Reexamination Certificate

active

10178234

ABSTRACT:
A method of selecting alignment marks, to be detected, from a plurality of alignment marks formed on a substrate includes the step of calculating a deviation between a distance of a designed position of an alignment mark from a reference position and a reference value, with respect to each of the plurality of alignment marks. The alignment marks, to be detected, are selected based on the deviations.

REFERENCES:
patent: 4566795 (1986-01-01), Matsuura et al.
patent: 4780617 (1988-10-01), Umatate et al.
patent: 4962318 (1990-10-01), Nishi
patent: 5695897 (1997-12-01), Mitome et al.
patent: 5805866 (1998-09-01), Magome et al.
patent: 6342703 (2002-01-01), Koga et al.
patent: 6399283 (2002-06-01), Hoshi
patent: 6481003 (2002-11-01), Maeda
patent: 6587201 (2003-07-01), Nishi
patent: 6876946 (2005-04-01), Yasuda et al.
patent: 6885908 (2005-04-01), Yoshida et al.
patent: 2002/0042664 (2002-04-01), Kikuchi
patent: 63-232324 (1988-09-01), None
patent: 63-232325 (1988-09-01), None

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