Aligning apparatus and method for mitigating instability caused

Details Aligning apparatus and method for mitigating instability caused Aligning apparatus and method for mitigating instability caused

1982-12-20

1986-03-11

Evans, F. L.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

250548, 250557, G01B 1126

Patent

active

045752508

ABSTRACT:
An aligning apparatus and method aligns a mask and a wafer stably at their regular positions in spite of the presence of the disturbance of alignment signals by the light interference effect when the printing of a semiconductor circuit pattern is effected with the mask and wafer in proximity to each other and further when the printing is effected with the mask pattern projected to the wafer.

REFERENCES:
patent: 4367046 (1983-01-01), Lacombat

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