Aligning apparatus

Optics: measuring and testing – By alignment in lateral direction – With registration indicia

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Details

250548, 356400, G01B 1100

Patent

active

046592288

ABSTRACT:
Disclosed is an aligning apparatus in which two bodies such as a semiconductor mask and a wafer having elongate (or bar-like) alignment marks are scanned by a bar-like beam having an elongate irradiating area and further scanned by the bar-like beam with the direction of inclination thereof changed, and the positional relation between the two bodies is detected, whereby alignment of the two bodies is achieved. The bar-like beam is formed by an anamorphic optical system (for example, a cylindrical lens or the like). The bar-like beam scans the alignment marks through a beam scanning system, and the inclination of the beam is changed by beam inclination changing element at a desired time, for example, after the first cycle of scanning has been terminated, and then scanning is effected again.

REFERENCES:
patent: 3388650 (1968-06-01), Westphalen
patent: 3398918 (1968-08-01), Girault
patent: 3495891 (1970-02-01), Lee
patent: 3704997 (1972-12-01), Smith
patent: 3825316 (1974-07-01), Amodei
patent: 4199219 (1980-04-01), Suzki et al.
patent: 4277178 (1981-07-01), Cushing et al.
patent: 4278893 (1981-07-01), Kato et al.
patent: 4423959 (1984-01-01), Nakazawa et al.
patent: 4531060 (1985-07-01), Suwa et al.
Jenkins and White, "Fundamentals of Optics" p. 245.

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