Alicyclic methacrylate having oxygen substituent group on...

Details Alicyclic methacrylate having oxygen substituent group on... Alicyclic methacrylate having oxygen substituent group on...

2006-05-09

2006-05-09

Price, Elvis O. (Department: 1621)

Organic compounds -- part of the class 532-570 series

Organic compounds

Carboxylic acid esters

Reexamination Certificate

active

07041846

ABSTRACT:
Alicyclic methacrylate compounds having an oxygen substituent group on their α-methyl group, represented by formula (1), are novel wherein R1is H or C1–C10alkyl which may contain a halogen atom, hydroxyl group, ether bond, carbonyl group, carboxyl group or cyano group, and R2is a monovalent C3–C20organic group having an alicyclic structure. Polymers prepared from these alicyclic methacrylate compounds have improved transparency, especially at the exposure wavelength of an excimer laser, and improved dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, show a high resolution, allow smooth development, lend themselves to micropatterning, and are thus suitable as micropatterning material for VLSI fabrication

REFERENCES:
patent: 6080524 (2000-06-01), Choi
patent: 6287747 (2001-09-01), Choi et al.
patent: 4-39665 (1992-02-01), None
patent: 2004-53822 (2004-02-01), None
patent: 2004-118136 (2004-04-01), None
patent: 2004-161860 (2004-06-01), None

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