Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Field effect transistor
Reexamination Certificate
2005-06-29
2009-06-16
Estrada, Michelle (Department: 2823)
Active solid-state devices (e.g., transistors, solid-state diode
Heterojunction device
Field effect transistor
C257S012000, C257S200000, C257S201000, C257SE29246, C257SE29247, C257SE21403, C257SE21407
Reexamination Certificate
active
07547928
ABSTRACT:
The present invention recites a new method for manufacturing Group III-N field-effect devices, such as HEMT, MOSHFET, MISHFET devices or MESFET devices, grown by Metal-Organic Vapor Phase Expitaxy, with higher performance (power), by covering the surface with a thin SiN layer on the top AlGaN layer, in the reactor where the growth takes place at high temperature, prior cooling down the structure and loading the sample out of the reactor, as well as a method to produce some HEMT transistors on those heterostructures, by depositing the contact on the surface without any removal of the SiN layer by MOCVD. The present invention recites also a device.
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patent: 2002/0096692 (2002-07-01), Nakamura et al.
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Search report dated Nov. 19, 2007 for equivalent European Patent No. 05447155.2-2203 filed Jun. 29, 2005.
Derluyn Joff
Germain Marianne
Leys Maarten
Estrada Michelle
Interuniversitair Microelektronica Centrum (IMEC)
Knobbe Martens Olson & Bear LLP
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