ALD ZnO seed layer for deposition of ZnO nanostructures on a...

Details ALD ZnO seed layer for deposition of ZnO nanostructures on a... ALD ZnO seed layer for deposition of ZnO nanostructures on a...

2007-03-20

2007-03-20

Toledo, Fernando L. (Department: 2823)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Responsive to electromagnetic radiation

C438S104000, C257SE51016, C257SE51029

Reexamination Certificate

active

10976594

ABSTRACT:
Zinc-oxide nanostructures are grown without using a metal catalyst by forming a seed layer of polycrystalline zinc oxide on a surface of a substrate. The seed layer can be formed by an atomic layer deposition technique. Growth of at least one zinc-oxide nanostructure is induced on the seed layer. The seed layer can alternatively be formed by using a spin-on technique, such as a metal organic deposition technique, a spray pyrolisis technique, an RF sputtering technique or by oxidation of the seed layer.

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