ALD apparatus and method

Details ALD apparatus and method ALD apparatus and method

2004-06-28

2010-02-16

Chen, Bret (Department: 1792)

Coating apparatus

Gas or vapor deposition

With treating means

C118S733000, C117S201000, C427S008000, C427S009000, C427S248100

Reexamination Certificate

active

07662233

ABSTRACT:
Improved apparatus and method for SMFD ALD include a method designed to enhance chemical utilization as well as an apparatus that implements lower conductance out of SMFD-ALD process chamber while maintaining full compatibility with standard wafer transport. Improved SMFD source apparatuses (700, 700′, 700″) and methods from volatile and non-volatile liquid and solid precursors are disclosed, e.g., a method for substantially controlling the vapor pressure of a chemical source (722) within a source space comprising: sensing the accumulation of the chemical on a sensing surface (711); and controlling the temperature of the chemical source depending on said sensed accumulation.

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