Compositions: coating or plastic – Coating or plastic compositions – Silicon containing other than solely as silicon dioxide or...
Patent
1998-07-07
2000-10-03
Brunsman, David
Compositions: coating or plastic
Coating or plastic compositions
Silicon containing other than solely as silicon dioxide or...
10628714, 427 96, 428447, 438780, 438790, C09D10300
Patent
active
061267333
ABSTRACT:
The invention relates to nanoporous dielectric films and to a process for their manufacture. Such films are useful in the production of integrated circuits. Such films are produced from a precursor of an alkoxysilane; a relatively low volatility solvent composition comprising a e C.sub.1 to C.sub.4 alkylether of a C.sub.1 to C.sub.4 alkylene glycol which is miscible in water and alkoxysilanes, having a hydroxyl concentration of 0.0084 mole/cm.sup.3 or less, a boiling point of about 175.degree. C. or more at atmospheric pressure and a weight average molecular weight of about 120 or more; a relatively high volatility solvent composition having a boiling point below that of the relatively low volatility solvent composition; optional water and an optional catalytic amount of an acid.
REFERENCES:
patent: 4865649 (1989-09-01), Kashwagi et al.
patent: 5504042 (1996-04-01), Cho et al.
patent: 5514211 (1996-05-01), Marks et al.
patent: 5736425 (1998-04-01), Smith et al.
patent: 5795378 (1998-08-01), Sakamoto et al.
Drage James
Ramos Teresa
Smith Douglas M.
Wallace Stephen
Allied-Signal Inc.
Brunsman David
Weise Leslie A.
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