Air-shower apparatus and semiconductor wafer processing method

Details Air-shower apparatus and semiconductor wafer processing method Air-shower apparatus and semiconductor wafer processing method

1999-03-29

2000-08-01

Ferensic, Denise L.

Ventilation

Clean room

B01L 104

Patent

active

060959177

ABSTRACT:
An air shower apparatus of this invention includes an air shower room, a ring member provided within the air shower room and having a plurality of air blowing outlets for blowing clean air in a direction of a chamber entrant to remove dust particles, and a vertical drive unit for moving the ring member up and down in such a manner that clean air is blown towards the chamber entrant from head to toe. The plurality of air blowing outlets are arranged at prescribed intervals along the inner periphery surface of the ring member in such a manner as to surround the chamber entrant.

REFERENCES:
patent: 4581986 (1986-04-01), Conklin et al.
patent: 4838150 (1989-06-01), Suzuki et al.
patent: 5562539 (1996-10-01), Hashimoto et al.

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