Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Quality evaluation
Reexamination Certificate
2007-09-11
2007-09-11
Nghiem, Michael P. (Department: 2863)
Data processing: measuring, calibrating, or testing
Measurement system in a specific environment
Quality evaluation
Reexamination Certificate
active
11123609
ABSTRACT:
A method for processing wafers in a batch processing tool that optimizes yield by minimizing within batch wafer variation in a wafer process. In a tool having a plurality of available wafer positions for a batch process, the method is useful when less than a full batch of wafers is to be processed. All of the possible wafer position combinations are determined and the within batch variation for each position combination is determined. The wafer position combination resulting in the least amount of within batch variation in the wafer process is then selected as the wafer placement combination for use in the process.
REFERENCES:
patent: 4238312 (1980-12-01), Galicki et al.
patent: 5639309 (1997-06-01), Akimoto
patent: 6389366 (2002-05-01), Heavlin
patent: 6605521 (2003-08-01), Ajmera et al.
patent: 2002/0199082 (2002-12-01), Shanmugasundram et al.
patent: 2005/0266173 (2005-12-01), Brcka
Kil-Soo Kim and Bong-Jin Yum, “Control Charts for Random and Fixed Components of Variation in the Case of Fixed Wafer Locations and Measurement Positions,” May 1999, IEEE Transactions on Semiconductor Manufacturing, vol. 12, No. 2.
H.J.A. Rulkens, E.J.J. van Campen, J.van Herk, and J.E. Rooda, “Batch Size Optimization of a Furnace and Pre-Clean Area by Using Dynamic Simulations,” 1998, IEEE/SEMI Advanced Semiconductor Manufacturing Conference.
Muro Amelia Clara
Walker Andrew Crehan
Wong Yeak-Chong
Hitachi Global Storage Technologies - Netherlands B.V.
Nghiem Michael P.
Zilka-Kotab, PC
LandOfFree
Aggregated run-to-run process control for wafer yield... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Aggregated run-to-run process control for wafer yield..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Aggregated run-to-run process control for wafer yield... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3747072