Agent and method for the removal of photoresist and stripper res

Details Agent and method for the removal of photoresist and stripper res Agent and method for the removal of photoresist and stripper res

1987-07-20

1988-11-22

Dees, Jose G.

Radiation imagery chemistry: process, composition, or product th

Stripping process or element

430326, 430329, 430331, 134 38, 252 8, 252 14, G03C 1112

Patent

active

047865784

ABSTRACT:
Photoresist and stripper residues can be rapidly and completely removed from semiconductor substrates after the stripping process with an aqueous post-rinsing agent which contains a nonionogenic surfactant and an organic base.

REFERENCES:
patent: 2914482 (1959-11-01), Kopp
patent: 3663445 (1972-05-01), Augustin et al.
patent: 3870647 (1975-03-01), Travers
patent: 3983078 (1976-09-01), Collins
patent: 4202703 (1980-05-01), Zuber et al.
patent: 4202800 (1980-05-01), Ciko et al.
patent: 4592787 (1986-06-01), Johnson
"Photoresist Materials and Processes", S. DeForest, 1975, McGraw Hill Book Co.
Patents Abstract of Japan, vol. 8, No. 208, P-302, 1645, Sep. 1984.

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