Aerosol-plasma deposition of films for electronic cells

Details Aerosol-plasma deposition of films for electronic cells Aerosol-plasma deposition of films for electronic cells

1993-09-13

1994-11-22

King, Roy V.

Superconductor technology: apparatus, material, process

Processes of producing or treating high temperature...

Coating

427565, 427569, 427600, 427226, 4274191, 427421, 427 62, 427576, 429 30, 505704, 505702, B05D 306, B05D 302

Patent

active

053667700

ABSTRACT:
An atmospheric process for the production of a coating of film upon a nickel-containing substrate. In the first step of this process, an aerosol mist containing reactants necessary to form the coating is provided. Thereafter, the mist is subjected to radio-frequency radiation while in the plasma region. Thereafter, the vaporized mixture is then deposited onto a nickel substrate. In subsequent steps, one or more other layers of vaporized material may be deposited onto the coated substrate.

REFERENCES:
patent: 4831965 (1989-05-01), Brian et al.
patent: 5032568 (1991-07-01), Lau et al.
patent: 5120703 (1992-06-01), Snyder et al.
patent: 5260105 (1993-11-01), Wang

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