Aerosol chemical vapor deposition of metal oxide films

Superconductor technology: apparatus – material – process – High temperature – per se – Having tc greater than or equal to 150 k

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505734, 505737, 505742, 427 62, 4271263, 4272553, 4272552, 4272551, 427314, C23C 1600, B05D 512

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052781380

ABSTRACT:
A process of preparing a film of a multicomponent metal oxide including: forming an aerosol from a solution comprised of a suitable solvent and at least two precursor compounds capable of volatilizing at temperatures lower than the decomposition temperature of said precursor compounds; passing said aerosol in combination with a suitable oxygen-containing carrier gas into a heated zone, said heated zone having a temperature sufficient to evaporate the solvent and volatilize said precursor compounds; and passing said volatilized precursor compounds against the surface of a substrate, said substrate having a sufficient temperature to decompose said volatilized precursor compounds whereby metal atoms contained within said volatilized precursor compounds are deposited as a metal oxide film upon the substrate is disclosed. In addition, a coated article comprising a multicomponent metal oxide film conforming to the surface of a substrate selected from the group consisting of silicon, magnesium oxide, yttrium-stabilized zirconium oxide, sapphire, or lanthanum gallate, said multicomponent metal oxide film characterized as having a substantially uniform thickness upon said

REFERENCES:
patent: 4571350 (1986-02-01), Parker et al.
DeSisto et al. in Mat. Res. Bull., vol. 24 pp. 753-760 (1989) entitled "Preparation and Characterization of Copper(II) Oxide Thin Films Grown by a Novel Spray Pyrolysis Method".
Lambeck et al. in "Sensors & Actuators", edited by J. C. Lodder, pp. 85-95 (1986), entitled Thin Layer Formation by Chemical Aerosol Deposition.
Kodas et al., in Appl. Phys. Lett. vol. 52, pp. 1622-1624, May 9, 1988, entitled Aerosol Flow Reactor Production of Fine Y.sub.1 Ba.sub.2 Cu.sub.3 O.sub.7 Powder ; Fabrication of Superconducting Ceramics.
Pebler et al. in Mat. Res. Bull., vol. 23, pp. 1337-1344 (1988), entitled Synthesis of Small Particle Size YBa.sub.2 Cu.sub.3 O.sub.7-x By a Vapor Phase Process.
Chu et al. in J. Appl. Phys vol. 64, pp. 2523-2526 (Sep. 1988), entitled Epitaxial Growth of High T.sub.c superconducting Y--Ba--Cu--O Thin Films on (001)MgO by a Chemical Spray Pyrolysis Method.
Cooper et al. in Materials Letters, vol. 7, pp. 5-8 (Aug. 1988), entitled Bismuth Strontium Copper Oxide High-T, Superconducting Films From Nitrate Precursors.
Kawai et al. in Japanese J. of App. Phys., vol. 26, pp. L1740-L1742 (Oct. 1987), entitled Formation of Y--Ba--Cu--O Superconducting Film by a Spray Pyrolysis Method.
Ottosson et al. in Appl. Phys. Lett., vol. 54, pp. 2476-2478 (Jun. 1989), entitled Chemical Vapor Deposition of the Superconducting YBa.sub.2 Cu.sub.37-x Phase Using Halides as Metal Sources.
Landet et al, "High T.sub.c superconducting films prepared by pyrolysis of an ultrasonic-generated aerosol," Journal of the Less-Common Metals V151PT2 May 1989 pp. 399-406.
Yamada et al., Funtai Oyobi Funmatsuyarin (Japan) v. 35:9, Dec. 1988 pp. 55-58.
Kodas et al., "Generation of thick Ba.sub.2 YCu.sub.3 O.sub.7 films by aerosol deposition", Appl. Phys. lett. 54(19) May 1989 pp. 1923-1925.
Nasu et al., "Ba.sub.2 YCu.sub.3 O.sub.x Films prepared by pyrolysis of organic or inorganic acid salts", MRS Symposium Support (Nevada) Apr. 1988 pp. 101-104.
"Laser-induced Deposition of superconducting materials by thermal decomposition of organometallic films", Research Disclosure, Dec. 1988, Number 296.

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