Aerial reticle inspection with particle beam conversion

Details Aerial reticle inspection with particle beam conversion Aerial reticle inspection with particle beam conversion

2007-02-27

2007-02-27

Pham, Hoa Q. (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S237500, C250S208100, C250S311000

Reexamination Certificate

active

10702524

ABSTRACT:
One embodiment disclosed relates to an apparatus for inspecting or revieiwing a mask or reticle. The apparatus includes at least an optical system, a converter plate, and an electron system. The optical system projects an optical illumination onto the mask. The optical signal from the mask is received by the converter plate. The converter plate transforms the optical signal to a corresponding electron signal. The electron signal is imaged by the electron system.

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patent: 7032208 (2006-04-01), Yamashita
patent: 2004/0159787 (2004-08-01), Nakasuji et al.

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