Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Mesa formation
Patent
1999-04-16
2000-04-11
Picardat, Kevin M.
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Mesa formation
438 46, 438 47, H01L 2100
Patent
active
060487488
ABSTRACT:
For AlGaAs LEDs the confining layers adjoining the active layer possess the highest Al composition. From failure analysis of non-passivated, WHTOL-aged, AlGaAs LEDs, it was discovered that corrosion occurs the fastest at the exposed surfaces of the high Al-content confining layers. By placing a high-quality native oxide at the exposed surfaces of the high Al-content confining layers which protect from the formation of the `poor` oxide, it is possible for LEDs to retain essentially their same light output after 2,000 hours of WHTOL testing. Further, it is possible to improve carrier confinement, carrier injection, wave guiding, and other properties by increasing the Al-content of different layers.
REFERENCES:
patent: 5262360 (1993-11-01), Holonyak, Jr. et al.
patent: 5400354 (1995-03-01), Lupowise et al.
patent: 5403775 (1995-04-01), Holonyak, Jr. et al.
patent: 5517039 (1996-05-01), Holonyak, Jr. et al.
patent: 5550081 (1996-08-01), Holonyak, Jr. et al.
patent: 5567980 (1996-10-01), Holonyak, Jr. et al.
patent: 5696023 (1997-12-01), Holonyak, Jr. et al.
patent: 5798537 (1998-08-01), Nitta
patent: 5872020 (1999-02-01), Fujii
patent: 5888370 (1999-03-01), Sun et al.
Khare Reena
Kish Fred A.
Hewlett--Packard Company
Picardat Kevin M.
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