Semiconductor device manufacturing: process – Including control responsive to sensed condition
Reexamination Certificate
2007-05-15
2007-05-15
Graybill, David E. (Department: 2822)
Semiconductor device manufacturing: process
Including control responsive to sensed condition
C438S770000, C438S795000
Reexamination Certificate
active
10909497
ABSTRACT:
The present invention is generally directed to various advanced process control methodologies for thermal oxidation processes, and various systems for accomplishing same. In one illustrative embodiment, the method comprises measuring an ambient pressure of an environment external to an oxidation chamber, determining a correction factor based upon at least the measured ambient pressure, determining at least one parameter of a thermal oxidation process to be performed in the oxidation chamber based upon the determined correction factor, and performing the thermal oxidation process comprised of the determined parameter on at least one substrate positioned in the oxidation chamber.
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Culp Mark E.
Lall Pirainder S.
McBride Michael J.
Ramos Jesse C.
Ryskoski Matthew
Advanced Micro Devices , Inc.
Graybill David E.
Williams Morgan & Amerson P.C.
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