Abrading – Abrading process – With critical temperature modification or control of work or...
Patent
1998-09-18
2000-10-10
Scherbel, David A.
Abrading
Abrading process
With critical temperature modification or control of work or...
451168, 451173, 451 63, 451302, 451296, 451307, B24B 100
Patent
active
061296120
ABSTRACT:
Method for removing random scratches formed during the polishing of magnetic recording media, and for disposing on the surface of the media a near-circumferential texture which increases the recording reliability of the media while simultaneously reducing its failure rate. The present invention teaches the application of a low unit load force to a large surface pad and polishing tape combination while in contact with a rotating disk surface that is also moving in a circumferential direction to completely remove the random scratches previously formed by a polishing step. The scratches are removed with the aid of a specially designed, extremely fine alumina slurry composition which prevent producing similar size circumferential scratches at the high surface speeds. The methodology provides for a smoother disk surface than prior known super-polish/texture methodologies. The methodology taught by the principles of the present invention is inherently more uniform than known batch process for polishing and texturing disks and leads to increased efficiency of media manufacturing through reduced manufacturing and post-deployment failures.
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Freeman Eric Steck
Fung Simon Wing Tat
Reynen Frank Richard
Tefera Andu Alem
McDonald Shantese
Scherbel David A.
Seagate Technologies, Inc.
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