Advanced mask patterning with patterning layer

Details Advanced mask patterning with patterning layer Advanced mask patterning with patterning layer

2005-03-28

2008-12-02

Nguyen, Hung Henry (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C430S005000

Reexamination Certificate

active

07460209

ABSTRACT:
An imaging structure such as a mask or reticle may be fabricated using a patterning layer on an imaging layer. The patterning layer may have substantially different etch properties than the imaging layer. A first etch process may be selective of the patterning layer with respect to a resist layer. A second etch process may be selective of the imaging layer with respect to the patterning layer.

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patent: 7005216 (2006-02-01), Shiraishi et al.
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