Advanced ion beam measurement tool for an ion implantation...

Radiant energy – With charged particle beam deflection or focussing – With detector

Reexamination Certificate

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C250S398000, C250S3960ML, C250S492210, C250S492200

Reexamination Certificate

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06852984

ABSTRACT:
An array of high aspect openings enables fast and accurate measurement of incidence angle deviation and/or beam divergence. The high aspect ratio assures that only ions of a predefined small incidence angle range may reach a conductive detection surface, thereby allowing efficient control of the ion beam parallelism by maximizing the beam current through the high aspect ratio openings. Moreover, if the array of openings is provided with individual beam current measurement points, spatially resolved intensity measurements may be performed that allow estimation of the beam shape. Thus, a movable Faraday cup assembly may be replaced with the stationary array of high aspect ratio openings, thereby improving tool reliability.

REFERENCES:
patent: 5903002 (1999-05-01), Turner et al.
patent: 6437351 (2002-08-01), Smick et al.
patent: 6525327 (2003-02-01), Mitchell et al.
patent: 6768118 (2004-07-01), Nakayama et al.
patent: 6791094 (2004-09-01), Olson et al.
patent: 10050200 (2001-05-01), None
patent: WO 0020851 (2000-04-01), None
patent: WO 0151183 (2001-07-01), None

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