Advanced exposure techniques for programmable lithography

Details Advanced exposure techniques for programmable lithography Advanced exposure techniques for programmable lithography

2006-05-23

2006-05-23

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

Methods

C355S053000, C355S067000

Reexamination Certificate

active

07050155

ABSTRACT:
Advanced techniques for programmable photolithograhy provide enhanced resolution and other aspects of a photolithography system. The pseudo-inverse of a matrix is applied to the results of a calculation to control exposure energies.

REFERENCES:
patent: 5418598 (1995-05-01), Fukuda et al.
patent: 5467166 (1995-11-01), Shiraishi
patent: 5527645 (1996-06-01), Pati et al.
patent: 5998069 (1999-12-01), Cutter et al.
patent: 6261728 (2001-07-01), Lin
patent: 6291110 (2001-09-01), Cooper et al.
patent: 6489984 (2002-12-01), Johnson
patent: 6879376 (2005-04-01), Case et al.
patent: 2005/0036783 (2005-02-01), Mortia et al.

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