Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2011-01-11
2011-01-11
Mariam, Daniel G (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S218000
Reexamination Certificate
active
07869643
ABSTRACT:
Inspection of objects such as semiconductor wafers may proceed on a cell-to-cell or die-to-die basis. An image of a wafer may be obtained and the cells or dies shown therein can be inspected using any combination of appropriate die-to-die or cell-to-cell inspection methods. For example, one or more areas may be designated for cell-to-cell inspection. For each cell type, a reference image can be generated by obtaining an image of the area and displacing the image by an amount equal to the repetition vector for that cell type in opposite directions. The displaced images and the original image can be combined into a single reference image. The original image can then be compared to the reference image. In some embodiments, the displaced images are also compared to the reference image to statistically determine the presence or absence of defects.
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Cohen Oren
Litichever Zeev
Sali Erez
Applied Materials South East Asia Pte. Ltd.
Mariam Daniel G
SNR Denton US LLP
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