Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Including solid – extended surface – fluid contact reaction...
Reexamination Certificate
2006-11-03
2009-12-08
Leung, Jennifer A (Department: 1797)
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
Including solid, extended surface, fluid contact reaction...
C422S211000, C422S212000, C422S222000, C422S171000, C422S172000, C422S173000, C422S144000, C096S108000, C096S130000
Reexamination Certificate
active
07628965
ABSTRACT:
A gas generating system comprises a catalytic reactor in fluid communication with a sulfur separator. The catalytic reactor oxidizes a fuel to provide a supply of carbon dioxide. The sulfur separator removes sulfur components from the stream before or after the fuel is oxidized. A portion of the hot exhaust gas from the catalytic reactor can be used to regenerate an adsorption bed of the sulfur separator.
REFERENCES:
patent: 3389829 (1968-06-01), Stanford
patent: 3781407 (1973-12-01), Kamijo et al.
patent: 3847298 (1974-11-01), Hamilton
patent: 3899099 (1975-08-01), Oiestad
patent: 6887381 (2005-05-01), Rohrbach et al.
patent: 2008/0187785 (2008-08-01), Kwok
patent: 2008/0199376 (2008-08-01), Limaye et al.
patent: 55-25659 (1980-02-01), None
patent: 11-10578 (1999-04-01), None
Santosh Y. Limaya, Phyre Technologies,PowerPoint presentation found on the web at www.fire.tc.faa.gov/ppt/systems/ 20051102—FAA—OBIGGS—Presentation—condensed.ppt, dated Nov. 2, 2005.
Johnson Russell
Yates Stephen F.
Zaki Rehan
Caglar Esq. Oral
Honeywell International Inc
Leung Jennifer A
Seifu Lessanework
LandOfFree
Advanced carbon dioxide fuel tank inerting system with... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Advanced carbon dioxide fuel tank inerting system with..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Advanced carbon dioxide fuel tank inerting system with... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4117982