Advanced automatic deposition profile targeting and control...

Details Advanced automatic deposition profile targeting and control... Advanced automatic deposition profile targeting and control...

2011-03-01

2011-03-01

Kasenge, Charles R (Department: 2121)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S108000, C451S005000

Reexamination Certificate

active

07899570

ABSTRACT:
The present disclosure relates to automatic deposition profile targeting with a combined deposition/polishing apparatus which obtains matching deposition and subsequent polishing profiles by use of feedback data from an advanced polish endpoint system in an advanced process control system.

REFERENCES:
patent: 5665199 (1997-09-01), Sahota et al.
patent: 6004187 (1999-12-01), Nyui et al.
patent: 6030887 (2000-02-01), Desai et al.
patent: 6171174 (2001-01-01), Campbell et al.
patent: 6271047 (2001-08-01), Ushio et al.
patent: 6276989 (2001-08-01), Campbell et al.
patent: 6440186 (2002-08-01), Sakai et al.
patent: 6503361 (2003-01-01), Nyui et al.
patent: 6540591 (2003-04-01), Pasadyn et al.
patent: 6589871 (2003-07-01), Yamaguchi et al.
patent: 6620031 (2003-09-01), Renteln
patent: 6630360 (2003-10-01), Christian et al.
patent: 6633831 (2003-10-01), Nikoonahad et al.
patent: 6912437 (2005-06-01), Chong et al.
patent: 6914000 (2005-07-01), Kamada
patent: 7008875 (2006-03-01), Birang et al.
patent: 7071106 (2006-07-01), Chuang et al.
patent: 7118451 (2006-10-01), Chen et al.
patent: 7201936 (2007-04-01), Schwarm et al.
patent: 2003/0092261 (2003-05-01), Kondo et al.
patent: 2003/0162385 (2003-08-01), Preusse et al.
patent: 2003/0220708 (2003-11-01), Sahin et al.
patent: 2004/0203321 (2004-10-01), Tsuchiyama et al.
patent: 2008/0146119 (2008-06-01), Sasaki et al.
patent: 2008/0183312 (2008-07-01), Funk et al.
patent: 2008/0183411 (2008-07-01), Funk et al.
patent: 2008/0183412 (2008-07-01), Funk et al.
patent: 2008/0183413 (2008-07-01), Deshpande et al.
Translation of Official Communication from German Patent Office for German Patent Application No. 10 2007 035 833.6-33 dated Apr. 9, 2008.

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