Data processing: generic control systems or specific application – Generic control system – apparatus or process – Optimization or adaptive control
Reexamination Certificate
2005-07-05
2005-07-05
Patel, Ramesh (Department: 2121)
Data processing: generic control systems or specific application
Generic control system, apparatus or process
Optimization or adaptive control
C700S028000, C700S021000, C700S045000, C700S079000, C700S080000, C700S081000, C700S262000, C714S001000, C714S002000, C714S020000, C714S026000, C714S057000, C361S115000, C361S127000, C702S185000, C702S183000
Reexamination Certificate
active
06915173
ABSTRACT:
Failure prediction for complex processes is performed utilizing one or more nonlinear regression models to relate operational variable values measured at two or more times to predicted process metric values and maintenance variable values.
REFERENCES:
patent: 5467883 (1995-11-01), Frye et al.
patent: 5559690 (1996-09-01), Keeler et al.
patent: 5654903 (1997-08-01), Reitman et al.
patent: 5740033 (1998-04-01), Wassick et al.
patent: 5784273 (1998-07-01), Madhavan
patent: 6004017 (1999-12-01), Madhavan
patent: 6268226 (2001-07-01), Angell et al.
patent: 6738954 (2004-05-01), Allen et al.
patent: 2001/0032025 (2001-10-01), Lenz et al.
patent: 196 37 917 (1998-03-01), None
patent: WO 01/57605 (2001-08-01), None
Advanced analysis of dynamic neural control advisories for process optimization and parts maintenance;Card, J.P.; Chan, W.T.; Cao, A.; Martin, W.; Morgan, J.; Advanced Semiconductor Manufacturing Conference and Workshop, 2003 IEEI/SEMI , Mar. 31-Apr. 1.
Utilization of the saturation effect on a DC motor drive with a fuzzy controller; Lee, C.K.; Chan, W.T.; Industrial Automation and Control: Emerging Technologies, 1995., International IEEE/IAS Conference on , May 22-27, 1995 , pp.: 342-349.
Precast production scheduling with genetic algorithms; Chan, W.T.; Hu, H.; Evolutionary Computation, 2000. Proceedings of the 2000 Congress on , vol.: 2, Jul. 16-19, 2000, pp.: 1087-1094 vol. 2.
Predicting failure modes to improve reliability; Reid, J.M.; Reliability and Maintainability Symposium, 1990. Proceedings., Annual , Jan. 23-25, 1990,pp.: 497-500.
Card et al., “Dynamic Neural Control for Plasma Etch Process,”IEEE Transactions on Neural Networks, (1997).
Dillon et al., “Guest Editorial Everyday Applications of Neural Networks,”IEEE Transactions on Neural Networks, 8:4 (1997).
Hatzipantelis et al., “Comparing Hidden Markov Models with Artificial Neural Network Architectures for Condition Monitoring Applications,”Artificial Neural Networks, 26-28, Conference Publication No. 409 (Jun. 1995).
Kim et al., “Intelligent Control of Via Formation by Photosensitive BCB for MCM-L/D Applications,”IEEE Transactions on Semiconductor Manufacturing, 12:503 (1999).
Konstantopoulos et al., “Controllers with Diagnostic Capabilities. A Neural Network Implementation. Journal of Intelligent and Robotic Systems,” Department of Electrical Engineering, University of Notre Dame, IN 12: 197-228 (1995).
Moyne, “AEC/APC Vision: A Research and Suppliers' Point of View, ” 3rdAnnual European AEC/APC Conference Proceedings (2002).
Rietman et al., “A Study onimg id="CUSTOM-CHARACTER-00001" he="3.13mm" wi="2.79mm" file="US06915173-20050705-P00701.TIF" alt="custom character" img-content="character" img-format="tif" ?m→img id="CUSTOM-CHARACTER-00002" he="3.13mm" wi="2.79mm" file="US06915173-20050705-P00701.TIF" alt="custom character" img-content="character" img-format="tif" ?1Maps: Application to a 0.16-μm Via Etch Process Endpoint,”IEEE(2000).
Rietman et al., “A System Model for Feedback Control and Analysis of Yield: A Multistep Process Model of Effective Gate Length, Poly Line Width, and IV Parameters”,IEEE(2001).
Rietman, “Neural Networks in Plama Processing,”Journal of Vacuum Science and Technology; Part B, IEEE Transactions on Semiconductor Manufacturing, 14:1 (2001).
Smyth et. al., “Hidden Markov Models an Neural Networks for Fault detection in Dynamic Systems,” California Institute of Technology (1993).
Zhang et al, “Control of Spatial Uniformity in Microelectronics Manufacturing: An Integrated Approach,” Proceedings of AEC/APC (2000).
Card Jill P.
Chan Wai T.
Reitman Edward A.
Goodwin & Procter LLP
Ibex Process Technology, Inc.
Patel Ramesh
LandOfFree
Advance failure prediction does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Advance failure prediction, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Advance failure prediction will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3415740