Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1989-06-12
1991-04-02
Dees, Jose
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430 22, G03F 100, G03F 900
Patent
active
050046586
ABSTRACT:
A system and method for adjusting the capacitance value of thin film capacitors during fabrication is provided. During formation of metal film capacitor plates on capacitor regions of a substrate, adjustment patterns comprised of multiple parallel adjustment lines corresponding to adjustment percentages of the capacitance value are formed in an area of the substrate adjacent to the capacitor regions. Selected adjustment lines of the adjustment patterns are offset aligned with corresponding lines of a photolithographic mask used during formation of the metal film capacitor plates in a re-etching process to selectively reduce the area of the capacitor plates to produce the desired decrease in capacitance value.
REFERENCES:
patent: 3963489 (1976-06-01), Cho
patent: 4755442 (1988-07-01), Hasebe et al.
Dees Jose
Electro-Films, Inc.
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