Adjustment method for an optical projection system to change ima

Details Adjustment method for an optical projection system to change ima Adjustment method for an optical projection system to change ima

1997-03-03

1999-08-31

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

G03F 900

Patent

active

059452390

ABSTRACT:
Methods and apparatus are disclosed for correcting distortion of a projection image obtained with a projection-exposure apparatus (such as a stepper) having a projection-optical system. Distortion is corrected even when the distortion of the projection image is not linear relative to depth in the optical-axis direction of the projection-optical system. Any distortion of the projection image is detected at a measurement surface and while the projection image is defocused in a direction along the optical axis relative to an image surface of the projection-optical system. Based on the detection results, the projection-optical system is adjusted to change the distortion relative to the converging surface of the projection-optical system.

REFERENCES:
patent: 4908656 (1990-03-01), Suwa et al.
patent: 5656403 (1997-08-01), Shieh
patent: 5677091 (1997-10-01), Barr et al.
patent: 5693439 (1997-12-01), Tanaka et al.

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