Adjustment method, exposure method, device manufacturing...

Details Adjustment method, exposure method, device manufacturing... Adjustment method, exposure method, device manufacturing...

2011-06-07

2011-06-07

Young, Christopher G (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

Reexamination Certificate

active

07955765

ABSTRACT:
An adjustment method for adjusting an illumination condition in illuminating an original plate using an illumination optical system and projecting an image of a pattern formed on the original plate onto a substrate through a projection optical system includes measuring a polarization state of light that has passed through the illumination optical system, the original plate, and the projection optical system in a state where the original plate is located on an object plane of the projection optical system, and adjusting the polarization state based on the measured polarization state.

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