Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1989-09-26
1992-06-23
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041801, G01N 2726, B01D 5702
Patent
active
051240203
ABSTRACT:
Adjustable aperture for photoelectric monitoring of a light transmitted through a capillary, wherein the aperture includes a device for providing a light beam having a predetermined limited extent in a vertical direction, a selectively operable device for limiting the extent of the light beam in a horizontal direction transverse to the vertical direction so that the extent in the horizontal direction can be selectively varied, and a device for positioning a capillary having longitudinal and diametral directions so that the diametral direction of the capillary lies in the vertical direction of the light beam and so that the beam of light passes through the capillary in a diametral dimensional thereof. The adjustable aperture can be used in combination with capillary zone electrophoresis and high performance liquid chromatography apparatus. Methods are provided for analyzing samples of one or more compounds by capillary zone electrophoresis or high performance liquid chromatography using the adjustable aperture.
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Wang, Tiansong; Hartwick, Richard A; Champlin, Paul B. "Adjustable aperture-width detector cell for on-column detection in capillary zone electrophoresis" Journal of Chromatography 462 (1989) 147-54.
Niebling John
Rutgers The State University
Starsiak Jr. John S.
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