Adjustable blade reticle assembly

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

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2504921, G21K 500

Patent

active

057808619

ABSTRACT:
Apparatus and method for inhibiting the image of a transparent, undesired feature on a reticle from printing on semiconductor material. The apparatus includes a frame attachment connected to a pellicle frame that is attached to a reticle. A blade that is opaque to ultraviolet light is moveable across the frame attachment and may be positioned proximate the undesired feature of the reticle to prevent the printing of the image of the undesired feature on the semiconductor material. The blade may be positioned above the undesired feature to inhibit ultraviolet light from an illumination source from impinging upon the undesired feature. Alternatively, the blade may be positioned below the undesired feature to inhibit ultraviolet light passing through the undesired feature from impinging upon the semiconductor material.

REFERENCES:
patent: 4425037 (1984-01-01), Hershel et al.
patent: 5097137 (1992-03-01), Ogoh
patent: 5347134 (1994-09-01), Hashimoto
patent: 5703675 (1997-12-01), Hirukawa et al.

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